Rivis specializes in the generation of high-pressure plasmas and their applications. Rivis is dedicated to advancing plasma science and technology, offering innovative products to support new discoveries.

Meet our team:

Dr. Kevin Smith, President, Board of Directors, 30-year product development and marketing veteran at Fortune 500 companies Tektronix and JDSU. Successfully led technical teams to grow business by over 100%, introduce new technologies and products accounting for over $100M of product sales. Implemented major systems to support marketing and sales growth. 3 patents from Tektronix

Dr. Gary McGuire (Founder), Board of Directors, Director of Business Development, CEO and founder of the International Technology Center, the parent non-profit research organization. Held management positions at Tektronix and MCNC. Involved in the commercialization of Tektronix’s first color ink jet printer and touch panel. Founder of Adámas Nanotechnologies (www.adamasnano.com) for the commercialization of over 100 nanodiamond-based products and Rivis inc. He has 25 patents and 130 scientific publications.

Scientific Advisory Board

Tony Jordan, Board of Directors, a 25+ year veteran of the Central Intelligence Agency (CIA) who held positions of increasing responsibility including Deputy Chief of Counter Intelligence and Deputy Director of Technical Services. Served as a Senior Fellow at In-Q-Tel, a not-for-profit venture firm established to keep the U.S. intelligence community equipped with the latest in technology, and later as Vice President for Technical Development and consultant for BBN Technologies (now part of Raytheon), known for its research advances in a wide variety of fields. Oversaw evaluation of proprietary, private-sector technologies for possible application in the intelligence and security fields

Dr. Charles R. “Chip” Eddy, Jr., Scientific Advisor Board, Science Director - Power & Energy, Advanced Materials, Office of Naval Research Global – London; Directed research programs developing materials and devices for energy and power applications leading teams across many disciplines. He has received numerous awards and recognitions including the E.O. Hulburt Science and Engineering Award from the Naval Research Laboratory. He has over 300 publications, 27 patents and has given approximately 150 invited talks.

Dr. Olga Shenderova, Scientific Advisory Board, President, Founder Adámas Nanotecnologies Inc. Raleigh, NC, winner Albert Nerken Award, American Vacuum Society, Member Society of American Institute of Physics, Editorial Board Journal of Diamond and Related Materials, Author of over 220 scientific articles, 20 book chapters, 6 books edited, 27 patents. Successfully introduced >100 new products at Adámas under SBIR and other federal grant funding

Dr. John Prater, Scientific Advisory Board, spent ten years as research scientist in Advanced Materials and Coatings Division, DOE Pacific Northwest Laboratory in Richland, WA. The remainder of his career was with the U.S. Army Research Office, where he managed a fundamental research program that focused on design and assembly of nano-engineered electronic materials.

Why Rivis, Inc.?

Rivis is a leader in atmospheric pressure plasma technology, with six patents covering key aspects of the technology. With over a decade of experience in the field Rivis envisions a number of industrial applications based upon application of the high energy density discharges

Vision:

Rivis’ vision is to be a leader in the development of products that utilize the high charged particle density discharges at high pressure.

Knowledge Base

What is an atmospheric plasma?

At increasing pressure in a chamber, it becomes more difficult to generate a discharge in a gas. By using a rapid risetime voltage pulse that reaches a voltage higher than the breakdown voltage of a gas before plasma formation begins, high density discharges may be formed over a range of pressures up to and above atmospheric pressure. At a voltage greater than breakdown (overvoltage) discharge formation spreads laterally across the electrode resulting in more uniform high current density discharges.

Operation at high pressure eliminates or minimizes the requirements for a vacuum envelope. The enclosure may be used to provide a controlled ambient which may range from inert to reactive gases and including air. Common applications include surface treatment, modification, and functionalization, cleaning, and deposition. At high pressure ion and electron energies are low minimizing damage to surfaces as a result of plasma treatment.

Patents:

Pulsed dielectric barrier discharge, US 7,615,933B2

Pulsed dielectric barrier discharge, US 7615931B2

Pulsed dielectric barrier discharge, US 8084947B2

Pulsed dielectric barrier discharge, US 8344627B1

Self-tuned dielectric barrier discharge US 9414478B2

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